Document Type
Article
Publication Date
12-1-2010
Abstract
The integration of block-copolymers and nanoimprint lithography presents a novel and cost-effective approach to achieving nanoscale patterning capabilities. The authors demonstrate the fabrication of a surface-enhanced Raman scattering device using templates created by the block-copolymers nanoimprint lithography integrated method.
Recommended Citation
Yang, E. L.; Liu, C. C.; Yang, C. Y.P.; Nealey, P. F.; Steinhaus, C. A.; and Skinner, Jack L., "Nanofabrication of Surface-Enhanced Raman Scattering Device by an Integrated Block-Copolymer and Nanoimprint Lithography Method" (2010). Mechanical Engineering. 4.
https://digitalcommons.mtech.edu/gen_engr/4