The integration of block-copolymers and nanoimprint lithography presents a novel and cost-effective approach to achieving nanoscale patterning capabilities. The authors demonstrate the fabrication of a surface-enhanced Raman scattering device using templates created by the block-copolymers nanoimprint lithography integrated method.
Yang, E. L.; Liu, C. C.; Yang, C. Y.P.; Nealey, P. F.; Steinhaus, C. A.; and Skinner, Jack L., "Nanofabrication of Surface-Enhanced Raman Scattering Device by an Integrated Block-Copolymer and Nanoimprint Lithography Method" (2010). Civil Engineering. 4.